16nm functional 0.039&#x00B5;m<sup>2</sup> 6T-SRAM cell with nano injection lithography, nanowire channel, and full TiN gate
2009 IEEE International Electron Devices Meeting (IEDM) (2009) - Comments
doi: 10.1109/iedm.2009.5424252 

Hou-Yu Chen, Chun-Chi Chen, Fu-Kuo Hsueh, Jan-Tsai Liu, Chih-Yen Shen, Chiung-Chih Hsu, Shyi-Long Shy, Bih-Tiao Lin, Hsi-Ta Chuang, Cheng-San Wu, Chenming Hu, Chien-Chao Huang, Fu-Liang Yang