Charge Trapping Memory with 2.85-nm Si-Nanoparticles Embedded in HfO2
ECS Transactions (2015) - Comment
doi: 10.1149/06640.0017ecst  issn: 1938-6737  issn: 1938-5862 

Nazek El-Atab, Berk Berkan Turgut, Ali Okyay, Ammar Nayfeh