Growth of InGaAs/InP quantum well structures by low-pressure metalorganic chemical vapor deposition
Microelectronic Engineering (1992) - Comment
doi: 10.1016/0167-9317(92)90123-9  issn: 0167-9317 

V.R McCrary, J.W Lee, S.N.G Chu, S.E.G Slusky, M.A Brelvi, G Livescu, P.M Thomas, L.J.P Ketelsen, J.L Zilko