Advanced Materials (2018) - Comments
pubmed: 29334145  doi: 10.1002/adma.201705796  issn: 0935-9648  issn: 1521-4095 

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Hui Li, Qi Li, Peng Wen, Trey B. Williams, Shiba Adhikari, Chaochao Dun, Chang Lu, Dominique Itanze, Lin Jiang, David L. Carroll, George L. Donati, Pamela M. Lundin, Yejun Qiu, Scott M. Geyer